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用脉冲激光气相沉积法在金属钼基底上制备锆薄膜,并用SEM,AFM,XRD等手段分析薄膜表面形貌和晶体结构,研究了脉冲激光频率对薄膜表面形貌和晶体结构的影响。结果表明:随着激光脉冲频率的提高锆薄膜表面液滴数目增加,液滴尺寸增大,薄膜的沉积速率显著降低。薄膜表面的平均纳米颗粒尺寸,随着频率的提高呈现先增大后减小的规律。从XRD数据发现,较高的脉冲频率极大地促进了薄膜的结晶性生长;但是,频率变化对Zr薄膜晶体结构、晶面择优生长的影响并不明显,薄膜呈现典型的hcp结构且不随频率的变化改变。
Zirconium thin films were prepared on metal molybdenum substrates by pulsed laser vapor deposition. The surface morphology and crystal structure of the thin films were analyzed by SEM, AFM and XRD. The effects of pulse laser frequency on the surface morphology and crystal structure were studied. The results show that with the increase of the laser pulse frequency, the number of droplets on the surface of zirconium thin films increases, and the droplet size increases and the deposition rate of the thin films decreases significantly. The average size of the nanoparticles on the surface of the film showed the first increase and then decrease with the increase of the frequency. From the XRD data, it is found that the higher pulse frequency greatly promotes the crystalline growth of the films. However, the influence of the frequency changes on the crystal structure and the preferred growth of the Zr thin films is not obvious. The films exhibit a typical hcp structure without frequency dependence Change changes.