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在进行大规模集成电路光刻时 ,采用同步辐射光源是一项新技术。本文介绍了同步辐射光刻镜扫描控制系统。通过提高光刻镜扫描的控制精度和优选扫描振动频率 ,能够改善光栅的均匀度 ,以满足曝光的需要
Synchrotron radiation is a new technology for large scale integrated circuit lithography. This article describes the synchrotron radiation scanner control system. By increasing the control accuracy and preferably the scanning frequency of the scanning of the mirror, the uniformity of the grating can be improved to meet the needs of exposure