场致发射显微分析术是基于量子隧道效应工作的显微分析术。自问世以来,在它发展的各个阶段,均为当时分辨率最高的显微分析工具。由于它结构简单,分辨率高,直接给出表面原子在正空间的图象,成为研究分析固体表面界面和微观结构的有力工具,受到各发达国家的充分重视。本文简单地回顾和介绍了该技术的发展历史和当前的发展概况,并重点介绍了我们在国家科学基金委员会等部门的资助下研制的“场致发射显微分析综合系统”和运用它所取得的初步成果。 Field emission microscopy is a microscopic analysis based on the work of quantum tunneling. Since its inception, at all stages of its development, it has been the highest-resolution microscopic analysis tool of its time. Due to its simple structure and high resolution, the image of the surface atom in the positive space is directly given, which becomes a powerful tool for studying and analyzing the interface and microstructure of the solid surface, which has been given full consideration by all the developed countries. This paper simply reviews and introduces the development history of the technology and the current development overview, and highlights the “field emission microscopy integrated system” developed by us with the help of the National Science Foundation and other departments and the application of it The initial results.