本公司专业生产的CYB-S系列产品,采用了薄膜技术中先进的离子束溅射与刻蚀工艺,与传统的扩散硅技术相比,使用温度范围宽,稳定性好,特别适宜在各种恶劣环境中使用。 CYB-S系列产品主要工作性能与特点 ·量程广:0～0.1MPa至0～60MPa ·防爆标志:dⅡBT4 ·精度高:0.1％,0.25％,0.5％ ·稳定性高:<0.1％FS/6个月 The company specializing in the production of CYB-S series of products, the use of thin-film technology in advanced ion beam sputtering and etching process, compared with the traditional diffusion of silicon technology, the use of wide temperature range, good stability, especially suitable for a variety of Used in harsh environments. CYB-S series of products, the main performance and features Wide range: 0 ~ 0.1MPa to 0 ~ 60MPa Explosion-proof mark: d Ⅱ BT4 High accuracy: 0.1%, 0.25%, 0.5% High stability: <0.1% FS / 6 Months