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研究了电弧离子镀磁性靶材使用过程中发生“跑弧”并导致靶材无法稳定刻蚀的问题.利用有限元方法(FEM)对外加磁场下非磁性靶材系统和磁性靶材系统中的磁场分布进行了模拟.研究了外磁场对电弧斑点运动的影响机理,并结合电弧斑点放电的物理机制,探讨了磁性靶材与低饱和蒸气压金属靶壳、绝缘陶瓷靶壳或软磁性金属靶壳组成复合结构靶材解决磁性靶材使用问题的可行性.结果表明,这3种复合结构靶材设计方案均能有效解决电弧离子镀磁性靶材“跑弧”问题.通过实验得到,在低饱和蒸气压金属或绝缘陶瓷靶壳设计方案里,靶材频繁引弧到弧斑能受控运动的转变温度为(136.6±23.0)℃.
The problem of “running arc” occurred in the process of using arc ion plating magnetic target and the target can not be stably etched was studied.The finite element method (FEM) was used to simulate the nonmagnetic target system and the magnetic target system The magnetic field distribution in the magnetic field is simulated.The influence mechanism of the external magnetic field on arc spot motions is studied.According to the physical mechanism of arc spot discharge, the effects of magnetic target and low saturation vapor pressure metal target shell, insulating ceramic target shell or soft magnetic The feasibility of using the magnetic target with the metal target shell to solve the problem of using the magnetic target was studied.The results show that the design schemes of the three kinds of composite target can effectively solve the problem of “arc running” It is found that in the design scheme of low saturation vapor pressure metal or insulated ceramic target shell, the transition temperature of controlled arc motion from target to arc spot is (136.6 ± 23.0) ℃.