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随着集成电路科学研究和生产的不断发展,光刻线条越来越细。成品率要求越来越高,由此对光刻机曝光系统的光强均匀性和曝光量的稳定性也提出了新的要求。在应用品振定时器时,曝光量的稳定性
With the continuous development of integrated circuit science research and production, lithography lines are getting smaller and smaller. Yield requirements are getting higher and higher, thus lithography exposure system light intensity uniformity and exposure stability also put forward new requirements. The stability of the exposure when the product vibration timer is applied