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我们利用X射线光电子能谱方法跟踪探测了a-Si薄膜的表面稳定性状况。对不同条件获得的a-Si薄膜作了XPS分析,并与c-Si作了比较.结果表明,表面稳定性按a-Si∶H>a-Si>c-Si的顺序递减,这对a-Si的表面钝化应用是很有利的.
We used X-ray photoelectron spectroscopy to trace the surface stability of a-Si films. The a-Si films obtained under different conditions were analyzed by XPS and compared with c-Si.The results showed that the surface stability decreased in the order of a-Si: H> a-Si> c-Si, The surface passivation application of -Si is very advantageous.