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报告了核工业西南物理研究院最近研制成功的改进型PSII―IM全方位离子注入工业样机。该机的真空室由不锈钢制成,其直径为1000 mm,长 1070 mm,采用多极会切磁场约束产生的等离子体。该机抽气系统由低温泵、扩散泵和机械泵组成。本底真空度小于 2×10- Pa。真空室内的气体等离子体可由热灯丝或射频放电产生, 4另外还配置了 4 个金属等离子体源、两套磁控溅射靶和冷却靶台。所以该机可以实现全方位离子注入或增强沉积薄膜。该机的负高压脉冲幅值为 10～90 kV, 重复频率为 50～500 Hz, 脉冲上升沿小于2 μs。一般情况下等离子体密度为 108～1010 cm- , 膜沉积速率为 30.1～1.0 nm/s。并给出了一些实验结果。
Southwest Institute of Physics, Nuclear Industry recently reported the successful development of improved PSII-IM omnidirectional ion implantation industrial prototype. The machine’s vacuum chamber is made of stainless steel and has a diameter of 1000 mm and a length of 1070 mm. It uses a plasma generated by a multi-pole, confined magnetic field. The machine exhaust system consists of cryogenic pumps, diffusion pumps and mechanical pumps. The background vacuum is less than 2 × 10-Pa. The gas plasma inside the vacuum chamber can be generated by hot filament or RF discharge. 4 There are also 4 metal plasma sources, two sets of magnetron sputtering target and cooling target. So the machine can achieve full range of ion implantation or enhanced deposition film. The aircraft negative pressure pulse amplitude of 10 ~ 90 kV, the repetition frequency of 50 ~ 500 Hz, the pulse rising edge is less than 2 μs. In general, the plasma density is 108-1010 cm-1 and the film deposition rate is 30.1-1.0 nm / s. Some experimental results are given.