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In recent years there has been great progress in the study of the fractal crystallizationin the metal/semiconductor bilayer film system. The nature of the fractal crystallizationin these bilayer films is being revealed. However, many of the studies focused on the growthmechanism of the fractal, while little attention has been given to the change in physicalproperties of the films during the fractal structure formation. After fractal crystallizationof a metal/semiconducor film there should exist evident change in its microstructure, which
In recent years there has been great progress in the study of the fractal crystallization in the metal / semiconductor bilayer film system. However, many of the studies focused on the growth mechanism of the fractal, while little attention has been given to the change in physical properties of the films during the fractal formation formation. After fractal crystallization of a metal / semiconducor film there should exists change change in its microstructure, which