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采用金属等离子体基离子注入的方法，在 Ａｇ基体上注入了 Ａｌ．用 Ｘ射线光电子能谱仪（ＸＰＳ）对注入层的 Ａｌ浓度一深度分布和化学态进行了分析．用ｘ射线衍射法（ＸＲＤ）对注入层和非平衡磁控溅射的则沉积层相组成进行了测定和比较，选用小掠射角（３°）ＸＲＤ对注入层的相组成进行了测定．结果表明，注入层中 Ａｌ浓度沿深度方向逐渐降低，表面有 Ａｇ原子存在；近表面处形成了 Ａｇ-Ａｌ固溶体并且出现了少量的 μ-Ａｇ３Ａｌ相；较深处有氧化铝的形成，出现 Ａｇ—Ａｌ固溶体、 μ—Ａｇ３Ａｌ相和氧化铝三相共存；更深处， Ａｌ含量很快下降， Ａｇ－Ａｌ固溶体消失，出现μＰ－Ａｇ３Ａｌ相和氧化铝共存 μ－Ａｇ３Ａｌ相为β－Ｍｎ复杂立方结构，可以在很宽的 Ａｌ含量范围内形成，而 Ａｌ沉积层中未出现 Ａｇ３Ａｌ相
Using metal-based plasma-based ion implantation method, Al was implanted into the Ag matrix. The Al concentration-depth distribution and chemical state of the implanted layer were analyzed by X-ray photoelectron spectroscopy (XPS). The phase composition of the deposited layer and the non-equilibrium magnetron sputtering deposited layer were measured and compared by X-ray diffraction (XRD). The phase composition of the implanted layer was determined by X-ray diffraction (XRD). The results show that the concentration of Al in the implanted layer gradually decreases along the depth direction, and there are Ag atoms on the surface. Ag-Al solid solution is formed near the surface and a small amount of μ-Ag3Al phase appears. -Al solid solution, the μ-Ag3Al phase coexists with the three phases of alumina. At deeper depths, the content of Al decreases rapidly and the Ag-Al solid solution disappears. The μ-Ag3Al phase coexists with the μP-Ag3Al phase as the β-Mn complex cubic structure , Can be formed over a wide range of Al contents, while the Ag3Al phase does not appear in the Al deposit