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采用电子束热蒸发技术在K9玻璃基底上以不同的沉积入射角沉积了单层TiO2薄膜,研究了不同入射沉积角沉积的TiO2薄膜的光学特性、填充密度和表面粗糙度,并比较了不同膜层厚度下薄膜表面粗糙度与入射沉积角之间的关系。研究结果表明,随着入射沉积角的增加,TiO2薄膜的透射率增加,透射峰值向短波移动,薄膜的填充密度从入射沉积角0°时的0.801降低到入射沉积角为75°时的0.341;薄膜的表面粗糙度随着入射沉积角的增加而增加,当入射沉积角为75°时,薄膜的表面粗糙度略高于基底的表面粗糙度。在沉积入射角不变时,随着膜层厚度的增加,膜层的表面粗糙度降低。
Single-layer TiO2 thin films were deposited on K9 glass substrates at different deposition angles using electron beam thermal evaporation technique. The optical properties, packing density and surface roughness of TiO2 films deposited at different incident deposition angles were investigated. Relationship between film surface roughness and incident deposition angle at layer thickness. The results show that with the increase of incident deposition angle, the transmittance of TiO2 film increases and the transmission peak shifts to short wave. The packing density decreases from 0.801 at the incident deposition angle of 0 ° to 0.341 at the incident deposition angle of 75 °. The film surface roughness increases with the incident deposition angle. When the incident deposition angle is 75 °, the surface roughness of the film is slightly higher than the surface roughness of the substrate. When the deposition angle is constant, the surface roughness of the film decreases with the increase of film thickness.