We describe the fabrication of silicon micro-hemispheres by adopting the conventional laser ablation of single crystalline silicon in the vacuum condition without using any catalysts or additives.The highly oriented structures of silicon micro-hemispheres exhibit many periodic nanoscale rings along their outer surfaces.We consider that the self-organized growth of silicon micro-structures is highly dependent on the laser intensity and background air medium.The difference between these surface modifications is attributed to the amount of laser energy deposited in the silicon material and the consequent cooling velocity. We describe the fabrication of silicon micro-hemispheres by employing the conventional laser ablation of single crystalline silicon in the vacuum condition without using any catalysts or additives. The highly oriented structures of silicon micro-hemispheres exhibit many periodic nanoscale rings along their outer surfaces. consider that the self-organized growth of silicon micro-structures is highly dependent on the laser intensity and background air medium. The difference between these surface modifications is attributed to the amount of laser energy deposited in the silicon material and the consequent cooling velocity.