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表面增强拉曼散射(Surface-enhanced Raman Scatting,SERS)是一种非常重要的化合物分析技术,在光谱分析、生物传感等领域有着广泛的应用。理想的SERS基底需要同时具有高灵敏度和高均一性,这就需要制备一种大面积并且周期小于100 nm的金属纳米阵列。同步辐射X射线干涉光刻技术具有很高的光刻分辨能力和均匀性,可以制备高密度的金属纳米阵列。利用X射线干涉光刻方法制备了区域面积为320μm×440μm和周期为100 nm的二维周期结构,同时保持了高复制性和优异的均匀性。金属纳米阵列作为表面增强拉曼散射基底时可以提供很好的灵敏度和重复性。对于R6G染料,最低探测极限可达10-9 mol·L-1。在单片样品内的均匀性良好,相对标准偏差为6.72%。此外,表面拉曼增强基底能重复利用,可进一步降低成本。
Surface-enhanced Raman scattering (SERS) is a very important compound analysis technique and has been widely used in the fields of spectrum analysis and biosensing. The ideal SERS substrate needs to have both high sensitivity and high uniformity, which requires the preparation of a large area and less than 100 nm periodicity of the metal nano-array. Synchrotron radiation X-ray lithography has high photolithographic resolution and uniformity, making it possible to fabricate high-density metal nanoarrays. A two-dimensional periodic structure having an area of 320 μm × 440 μm and a period of 100 nm was prepared by X-ray interference lithography while maintaining high reproducibility and excellent uniformity. Metallic nanoarrays provide good sensitivity and repeatability as surface-enhanced Raman scattering substrates. For R6G dyes, the minimum detection limit of up to 10-9 mol · L-1. The uniformity within the monolithic sample was good, with a relative standard deviation of 6.72%. In addition, the surface Raman reinforced substrate can be reused, can further reduce costs.