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厚度从几百纳米到几微米的无衬铝膜被广泛地用做软X射线的滤光片和衰减膜。例如在多靶的类氖锗软X射线激光实验中,谱线强度的变化有3～5个数量级,为保证记录底片能工作在线性区,需根据靶长的变化更换不同厚度的铝膜对实验中产生的软X射线进行衰减。又如在同步辐射软X射线波段的应用中,往往需要加很薄(几百纳米厚)的铝膜挡掉同步辐射中的可见光成分。此外,Al元素的K、L吸收边也被广泛地用于软X射线能量的定标中。 作者分别在同济大学和长春光学精密机械研究所用热蒸发和电子束蒸发两种方法制备了0.3μ到2.5μm厚的无衬铝膜。在已抛光的玻璃衬底上先蒸镀一层NaCl作为脱膜剂,然后蒸镀Al膜,经脱膜获得厚度均匀(不均匀性小于5％,在100平方毫米范围内)的无衬铝膜。杜杰,王珏等对Al膜所作的Auger谱分析表明:铝膜表面的氧化层大约有7.5nm厚,氧化的主要产物是Al_2O_3。
Lined aluminum films with thicknesses from a few hundred nanometers to several microns are widely used as soft X-ray filters and damping films. For example, in the multi-target neon-germanium-like soft X-ray laser experiment, the intensity of the line varies by 3 to 5 orders of magnitude. In order to ensure that the recording film can work in the linear region, aluminum films with different thicknesses The soft X-rays generated during the experiment attenuated. Another example is the synchrotron radiation soft X-ray band applications, often need to add very thin (hundreds of nanometers thick) of the aluminum block out of synchrotron radiation visible components. In addition, the K, L absorption edges of Al elements are also widely used for the calibration of soft X-ray energies. The authors prepared the 0.3μ to 2.5μm thick anodized aluminum film by thermal evaporation and electron beam evaporation at Tongji University and Changchun Institute of Optics and Fine Mechanics, respectively. A layer of NaCl is deposited on the polished glass substrate as a release agent, and then the Al film is evaporated to obtain a linerless aluminum with a uniform thickness (less than 5% inhomogeneity) within a range of 100 mm 2 membrane. Auger spectrum analysis of Al film by Du Jie and Wang Jue et al. Showed that the oxide layer on the surface of Al film is about 7.5 nm thick and the main product of oxidation is Al 2 O 3.