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采用粉末冶金和真空熔炼方法制备了原子比为Ti50Al50的合金靶材,利用磁控溅射工艺在同一工艺参数下制备了TiAlN涂层,借助扫描电镜、原子力显微镜、X射线衍射仪、纳米压痕和结合强度实验,研究了溅射靶材对TiAlN涂层的形貌、结构和力学性能的影响。结果表明:粉末靶材中Ti和Al以单质相存在,Ti镶嵌于Al基体周围,熔炼靶材中形成了TiAl和Ti3Al合金化片层组织;由于两种靶材在组织结构和导热性能上的不同导致其溅射产额、靶材温度和溅射金属离子能量等都出现了明显的差异;对涂层的影响表现为,相比于熔炼靶材涂层,粉末靶材涂层的沉积速率高44%,表面粗糙度低24%,涂层表面熔滴数目和尺寸较小;粉末靶材涂层呈现Ti2AlN相等轴晶生长方式,熔炼靶材涂层由于沉积温度较高表现为Ti2AlN相和TiN相,以等轴晶和柱状晶混合生长;相结构的不同导致涂层的硬度和结合强度出现差异,粉末靶材涂层硬度为25.69 GPa,结合强度属于HF-3,熔炼靶材涂层的硬度为28.22 GPa,结合强度属于HF-5。
TiAlN coatings were prepared by powder metallurgy and vacuum melting method with atomic ratio of Ti50Al50. The TiAlN coatings were prepared by magnetron sputtering at the same process parameters. Scanning electron microscopy, atomic force microscopy, X-ray diffraction, And bonding strength experiment, the effect of sputtering target on the morphology, structure and mechanical properties of TiAlN coating was studied. The results show that Ti and Al are present as single phase in the powder target and Ti is embedded around the Al matrix. TiAl and Ti3Al alloyed lamellar structures are formed in the target. Due to their different microstructures and thermal conductivity Differences lead to significant differences in sputtering yield, target temperature and sputtered metal ion energy, etc. The effect on the coating is manifested in that the deposition rate of the powder target coating, compared to the melting target coating, High 44%, low surface roughness of 24%, the number of droplets on the surface of the coating and the smaller size; powder coating Ti6AlN axis equiaxed axis growth mode, the melting of the target coating due to the deposition temperature is higher for the Ti2AlN phase and TiN phase with equiaxed grains and columnar grains mixed growth; different phase structure lead to differences in the hardness and bonding strength of the coating, the powder target coating hardness of 25.69 GPa, the bonding strength is HF-3, the melting target coating A hardness of 28.22 GPa and a bond strength of HF-5.