论文部分内容阅读
本文采用电子束蒸发配以Kaufman离子源产生的氧离子辅助沉积了Ta2O5薄膜,用原子力显微镜(AFM)表征了薄膜的表面形貌、表面粗糙度,探讨了Ta2O5薄膜在此工艺下的表面质量。用分光光度计测试了不同厚度下薄膜的透射率,计算出了其折射率。实验及分析结果表明:所制备的Ta2O5薄膜表面平整度高,是弱吸收薄膜,随薄膜厚度的增加短波截止波长向长波方向略有漂移;折射率随膜厚的变化不大,此制备工艺的可重复性强,制备薄膜性能稳定;薄膜表面粗糙度随膜厚的增加而增加,但是增加不大,所制备Ta2O5薄膜是理想光学薄膜;离子束的加入,使得薄膜表明形貌变化更加复杂,打破了热蒸发制备薄膜的柱状生长模式。
In this paper, Ta2O5 thin films were deposited by electron beam evaporation coupled with oxygen ions generated by Kaufman ion source. The surface morphology and surface roughness of the films were characterized by atomic force microscopy (AFM), and the surface quality of Ta2O5 thin films was investigated. The transmittance of the film under different thickness was measured by spectrophotometer, and its refractive index was calculated. Experimental and analytical results show that the prepared Ta2O5 film has a low surface roughness and a weak absorption film. As the thickness of the film increases, the short-wave cutoff wavelength shifts slightly in the long wavelength direction. The refractive index changes little with the film thickness. Repeatability and stability of prepared films. The film surface roughness increases with the increase of film thickness, but does not increase much. The prepared Ta2O5 film is an ideal optical film. The addition of ion beam makes the film show that the morphology changes more complicated, Breaking the columnar growth pattern of the film by thermal evaporation.