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对靶非平衡磁控溅射系统由两个相对磁控溅射靶和一个磁镜场约束系统构成 ,通过调整电磁线圈的激励电流可以控制磁镜场的空间分布状态 ,测量了合成磁场的空间分布状态。采用平面探针方法 ,在两靶中间位置测量了收集电流密度。结果表明 ,探针的收集电流密度随磁镜场的激励电流增加显著增大 ,在偏压 15 0V、工作气体 Ar、压力 0 .2 Pa和磁控溅射靶工作电流 3A时 ,收集的电流密度可以达到 5 .77m A / cm2 。
The target unbalanced magnetron sputtering system consists of two relative magnetron sputtering targets and a magnetic field confinement system. By adjusting the excitation current of the electromagnetic coil, the spatial distribution of the magnetic field can be controlled. The space of the magnetic field is measured Distribution status. The planar probe method was used to measure the collected current density at the middle of the two targets. The results show that the current density of the probe increases with the increase of excitation current in the magnetic field. The current collected at a bias voltage of 150 V, a working gas of Ar, a pressure of 0.2 Pa and a magnetron sputtering target current of 3 A, Density can reach 5 .77m A / cm2.