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CN x /SiCN composite films were prepared on titanium ( Ti ) alloy substrates by Radio Frequency Plasma Enhanced Chemical Vapor Deposition ( RF|PECVD ). As a buffer layer, SiCN ensured the adhesion of the CN x thin films on Ti substrates. X|ray diffraction ( XRD) measurement revealed that the composite films possessed α|C 3 N 4 structure. The microhardness of the films was 48 to 50 GPa. In order to test the characteristics of wear and corrosion resistances, we prepared Ti alloy samples with and without CN x /SiCN composite films. Also for strengthening the effect of wear and corrosion, the wear tests were carried out under high load (12 MPa) and in 0.9% NaCl solution. Results of the wear tests and the corrosive electrochemical measurements showed that the samples coated with CN x films had excellent characteristics of wear and corrosion resistances compared with Ti alloy substrate samples.
CN x / SiCN composite films were prepared on titanium (Ti) alloy substrates by Radio Frequency Plasma Enhanced Chemical Vapor Deposition (RF | PECVD). As a buffer layer, SiCN coated the CN x thin films on Ti substrates. The microhardness of the films was 48 to 50 GPa. In order to test the characteristics of wear and corrosion resistances, we prepared Ti alloy samples with and without CN x / SiCN composite films. Also for strengthening the effect of wear and corrosion, the wear tests were carried out under high load (12 MPa) and in 0.9% NaCl solution. Results of the wear tests and the corrosive electrochemical measurements showed that the samples coated with CN x films had excellent characteristics of wear and corrosion resistances compared with Ti alloy substrate samples.