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目的探讨低剂量长期砷暴露对HaCat细胞增殖及凋亡水平的影响。方法 HaCat细胞暴露于浓度为0、0.05、0.10μmol/L的NaAsO215周后,用直接细胞计数法计数对照组及染砷组细胞数,检测细胞增殖水平;用流式细胞仪测定10 000个细胞的细胞凋亡发生水平。结果各染砷组细胞增殖速率与对照组相比均显著增高(P<0.05),且0.10μmol/L组细胞增殖率(245.00±8.66)%显著高于0.05μmol/L组(165.00±15.00)%(P<0.05),细胞增殖水平与染砷剂量间呈显著剂量-效应关系;0.05μmol/L组(0.28±0.08)%及0.10μmol/L组(0.34±0.09)%细胞凋亡率均明显低于对照组(0.74±0.18)%(P<0.05)。结论长期低剂量砷暴露可使HaCat细胞的增殖能力明显增强,并诱导细胞凋亡率显著降低。
Objective To investigate the effects of low-dose long-term exposure to arsenic on the proliferation and apoptosis of HaCat cells. Methods After exposing HaCat cells to 0, 0.05 and 0.10 μmol / L of NaAsO2 for 15 weeks, the number of cells in the control group and the arsenic-exposed group was counted by direct cell counting to detect the cell proliferation. The flow cytometry The level of apoptosis. Results The proliferation rate of arsenic-treated group was significantly higher than that of the control group (P <0.05). The proliferation rate of the arsenic-treated group (245.00 ± 8.66)% was significantly higher than that of the 0.05μmol / L group (165.00 ± 15.00) (P <0.05). The cell proliferation level was significantly dose-effect relationship with the dose of arsenic-stained dose. The apoptotic rate of both 0.05μmol / L group (0.28 ± 0.08)% and 0.10μmol / L group (0.34 ± 0.09)% Significantly lower than the control group (0.74 ± 0.18)% (P <0.05). Conclusion Long-term low-dose arsenic exposure can significantly enhance the proliferation of HaCat cells and induce a significant decrease of apoptosis rate.