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5. Field Electron-Emission from a-CN<sub>x</sub>:H Films Formed on Al Films

Field Electron-Emission from a-CN<sub>x</sub>:H Films Formed on Al Films

来源 :现代物理(英文) | 被引量 : 0次 | 上传用户：flybear

【摘 要】

：

Hydrogenated amorphous carbon nitride (a-CNx:H) films were formed on p-Si, Al films deposited on n-Si (Al/n-Si) and glass (SiO2) (Al/glass) substrates, using pu

【作 者】

：

Haruhisa Kinoshita Sho Suzuki 

【机 构】

：

DepartmentofElectricalandElectronicEngineering

【出 处】

：

现代物理(英文)

【发表日期】

：

2015年11期

【关键词】

：

Supermagnetron PLASMA Chemical Vapor Deposition Amorphous Carbon NITRIDE FIELD E 

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Hydrogenated amorphous carbon nitride (a-CNx:H) films were formed on p-Si, Al films deposited on n-Si (Al/n-Si) and glass (SiO2) (Al/glass) substrates, using pulsed rf supermagnetron plasma chemical vapor deposition (CVD) with N2/i-C4H10 mixed gases. The

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