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光敏树脂分子量的多分散性对光刻胶性能有极大影响。聚乙烯醇肉桂酸酯是国内外最早和最广泛用于光刻工艺的光敏树脂,然而过去由于对其分子量的分散性注意不够,所制得之光刻胶不能适应更高要求,特别是大规模集成电路的光刻。但是我们将聚乙烯醇经分级精制,使其分子量分在范围大大缩小,平均聚合度由原来的1750提高到1911,并用热法进行酯化反应,制得聚乙烯醇肉桂酸酯光刻胶,其分辨率、抗蚀性和感光性大大改善,能达到或超过日本 OSR 光刻胶的水平,并有效地防止冻胶,质量优越。因此,它能在大规模集成电路中得到应用。我们认为高聚物的分
The polydispersity of the photosensitive resin has a great influence on the photoresist properties. Polyvinyl alcohol cinnamate is the earliest and most widely used photosensitive resin for lithography in the world. However, in the past, due to the insufficient attention paid to its molecular weight dispersion, the prepared photoresist can not meet the higher requirements, especially the large Lithography of scale integrated circuits. However, we polyvinyl alcohol refined by fractionation, the molecular weight in the range of greatly reduced, the average degree of polymerization increased from 1750 to 1911, and the use of thermal esterification reaction, polyvinyl alcohol cinnamate resist, Its resolution, corrosion resistance and photosensitivity greatly improved, to meet or exceed the level of Japan OSR photoresist, and effectively prevent jelly, superior quality. Therefore, it can be used in large scale integrated circuits. We think of high polymer points