采用国内研制的电子回旋共振化学气相沉积设备(ECRCVD),在单晶硅片上沉积出了金刚石薄膜。通过扫描电子显微镜(SEM),X 射线衍射仪(XRD),激光拉曼谱仪(RAM)的测试,证明所沉积的薄膜具有明确的金刚石特征。所采用的 ECRCVD 设备,具有可以低压沉积、大面积均匀生长以及低温生长的优点。这种方法在合成金刚石光学膜,半导体膜以及其它薄膜方面有重要的应用前景。 Using the electron cyclotron resonance chemical vapor deposition equipment (ECRCVD) developed in China, a diamond film is deposited on a monocrystalline silicon wafer. The deposited films were confirmed to have definite diamond features by scanning electron microscopy (SEM), X-ray diffraction (XRD) and laser Raman spectroscopy (RAM). The ECRCVD equipment used has the advantage of being able to deposit at low pressures, grow uniformly over large areas, and grow at low temperatures. This method has important application prospects in the synthesis of diamond optical films, semiconductor films and other films.