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一、前言TiO_2是光学和电学应用最重要的介质材料。TiO_2膜具有耐磨擦、硬度高、附着力强、耐潮湿等良好的机械性能和化学稳定性,在可见和近红外区透过率高,特别是具有高的折射率(n=2.1～2.76)。这些特点使光学薄膜工作者对TiO_2膜产生了极大兴趣。在理论上,Ti-O体系存在一系列钛氧化物,直接真空蒸发TiO_2,由于TiO_2发生分解失氧,形成高吸收的低价钛氧化物,所以得不到TiO_2膜。随着反应蒸发和反应溅射技术的出现和发展,真空镀制TiO_2膜
I. Introduction TiO 2 is the most important dielectric material for optical and electrical applications. TiO_2 film has good mechanical properties and chemical stability such as abrasion resistance, high hardness, strong adhesion, moisture resistance, high transmittance in visible and near infrared region, especially high refractive index (n = 2.1-2.76 ). These characteristics make the optical thin film workers have great interest in the TiO 2 film. In theory, a series of titanium oxides exists in the Ti-O system, and the TiO 2 film is directly vacuum evaporated. Since the TiO 2 is decomposed and oxygen is lost, a high absorption titanium oxide is formed, so that the TiO 2 film can not be obtained. With the emergence and development of reactive evaporation and reactive sputtering techniques, TiO 2 films are vacuum-deposited