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本文总结了关于Ｔｉ（１－ｘ）ＡｌｘＮ薄层的微结构特征和氧化行为的最新研究成果。Ｔｉ（１－ｘ）ＡｌｘＮ薄层含有３个不同的相区：ｘ值较小时，其微结构为立方晶系；ｘ值较大时，其微结构为六方晶系；ｘ为中间值时，其结构尚不清楚。应用选择性氧化机理，预测了具有不同Ｔｉ／Ａｌ比值的Ｔｉ１－ｘＡｌｘＮ薄层的氧化结果。
This paper summarizes the latest research results on the microstructure and oxidation behavior of Ti (1-x) AlxN thin films. The Ti (1-x) AlxN thin layer contains three different phase regions: the microstructure of the Ti (1-x) AlxN thin film is cubic when the value of x is small; and the microstructure of hexagonal Ti- Its structure is not yet clear. Using the selective oxidation mechanism, the oxidation results of Ti1-xAlxN thin films with different Ti / Al ratios were predicted.