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采用红外椭圆偏振光谱对微波等离子体化学气相沉积法 (MPCVD)和热丝化学气相沉积法 (HFCVD)制备的金刚石薄膜在红外波长范围 (2 5— 1 2 5 μm )的光学参数进行了测量 .建立了不同的光学模型 ,且在模型中采用Bruggeman有效介质近似方法综合考虑了薄膜表面和界面的椭偏效应 .结果表明 ,MPCVD金刚石膜的椭偏数据在模型引入了厚度为 77 5nm的硅表面氧化层、HFCVD金刚石膜引入 879nm粗糙层之后能得到很好的拟合 .最后对两种模型下金刚石薄膜的折射率和消光系数进行了计算 ,表明MPCVD金刚石薄膜的红外光学质量明显优于HFCVD金刚石薄膜
The optical parameters of diamond films prepared by microwave plasma chemical vapor deposition (MPCVD) and hot filament chemical vapor deposition (HFCVD) in the infrared wavelength range (2 5 -1 2 5 μm) were measured by infrared ellipsometry. Different optical models were established and the ellipsometric effects of the thin film surface and interface were comprehensively considered in the model using the Bruggeman effective medium approximation method.The results show that the ellipsometric data of the diamond film of MPCVD has been introduced into the silicon surface with a thickness of 77 5nm Oxide and HFCVD diamond films can be fitted well after being introduced into the rough layer of 879nm.Finally, the refractive index and extinction coefficient of the diamond films under two models are calculated, which shows that the infrared optical quality of MPCVD diamond films is obviously better than that of HFCVD diamond film