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提出了一种在原子力显微镜(AFM)基础上设计的探针诱导表面等离子体共振纳米光刻(PSPRN)系统。此系统不但实现了探针的精确控制,而且由于系统本身具有AFM的全部功能,因此可以实时检测样品表面的形貌以及光刻效果。系统采用改进的Kretschmann型共振耦合器件,在棱镜和样品基板之间注入匹配折射率油,使样品更方便更换;利用声光调制器与AFM配合实现了等离子体激发光照射时间的精确控制。通过初步实验,在银(Ag)膜表面获得了直径100 nm左右的光刻点,验证了PSPRN的可行性。研究了光照时间、激光功率、激光入射角、材料厚度等因素对光刻点大小、深度的影响,为实现更小的光刻点提供了参考。
A probe-induced surface plasmon resonance nanolithography (PSPRN) system based on atomic force microscope (AFM) was proposed. This system not only enables precise control of the probe, but also allows for the real-time detection of the topography and lithography of the sample surface, thanks to the full functionality of the AFM itself. The system uses an improved Kretschmann resonant coupling device to inject matched refractive index oil between the prism and the sample substrate to make the sample more convenient to be replaced. The precise control of the plasma excitation light irradiation time is realized by using the acousto-optic modulator and the AFM. Through the preliminary experiment, the lithography point about 100 nm in diameter was obtained on the surface of silver (Ag) film, which verified the feasibility of PSPRN. The influence of illumination time, laser power, laser incident angle, material thickness and other factors on the size and depth of the lithography point was studied, which provided a reference for the realization of the smaller lithography point.