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将非金属元素碘作为硅的KOH腐蚀液的添加物,在对(100)和(110)单晶硅片的各向异性腐蚀中,获得了更为丰富的异向腐蚀特性和更为光滑的腐蚀表面。当温度在95℃,KOH腐蚀液中碘的摩尔比为0.5时,得到了粗糙度均小于10nm的Si-(100)和(110)光洁表面,两晶面的腐蚀速率均为1.4μm/min。这两晶面在相同的条件下同时达到最佳光洁度,说明腐蚀速率是获得高光洁度表面的关键。实验还证明碘在热碱溶液中的稳定性和持久性要高于现在已被大量研究的双氧水和过硫等,尤其是对硅(110)表面光洁度的改善具有积极的促进作用。
The addition of non-metallic elemental iodine as an additive to the KOH corrosive solution of silicon gives richer anisotropic properties and smoother anisotropy in the (100) and (110) monocrystalline wafers Corrosion surface. When the mole ratio of iodine in KOH solution was 0.5 at 95 ℃, the Si- (100) and (110) smooth surfaces with roughness less than 10 nm were obtained. The corrosion rates of both surfaces were both 1.4 μm / min . These two crystal faces achieve the best finish at the same time under the same conditions, indicating that the corrosion rate is the key to achieving a high finish surface. The experiment also proves that the stability and durability of iodine in hot alkaline solution are higher than that of hydrogen peroxide and excess sulfur which have been studied extensively nowadays, especially for improving the surface finish of silicon (110).