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1985年6月下旬美国费城德克斯克大学副校长J·K·李·史密斯先生在湖南省科委张启人副主任陪同下参观了电子工业部第四十八研究所。所长向来宾作了该所情况的简单介绍。而后,在所领导的陪同下史密斯先生高兴地参观了该所的部分产品与实验室。当他在LC—2B型离子注入机装配间里得知该产品是该所小批生产的产品时,高兴地说:“Good,Good”！。他在参观反应离子束蚀刻机、离子束蚀刻机时,详细地询问了蚀刻的情况,并看了蚀刻后放大的图片。在参观600keV高能离子注入机时,史密斯先生
In late June 1985, Mr. J. Lee Smith, Vice Chancellor of Delphi University, Philadelphia, USA, accompanied by Deputy Director Zhang Qiren of Hunan Provincial Science and Technology Commission visited the 48th Institute of Electronics Industry. Director of the guest made a brief introduction of the situation. Then, accompanied by the leadership, Mr. Smith was pleased to visit some of the company’s products and laboratories. When he learned in the assembly room of the LC-2B ion implanter that the product was a small-batch product, he said happily: “Good, Good!” . He visited the reactive ion beam etching machine, ion beam etching machine, asked in detail about the etching, and read the picture after etching. While visiting 600keV high energy ion implanter, Mr. Smith