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采用SEM，TEM对金刚石膜-硬质合金基体横截面的形态进行了研究，探讨了甲烷含量对CVD金刚石膜-基横截面各组织层次的影响结果表明，经化学侵蚀脱钻和等离子体刻蚀脱碳预处理的YG8硬质合金基体上所沉积的金刚石膜-基横截面组织的典型层次依次为：金刚石薄膜／薄的石墨碳中间层／细小的WC层／残留的脱碳层（η相+W相）／残留的疏松层／YG8原始基体甲烷含量对CVD金刚石膜-基横截面各组织层次的形成有显著的影响
The morphology of the cross-section of the diamond film-cemented carbide substrate was studied by using SEM and TEM. The effects of methane content on the structure of CVD diamond film-substrate cross-section were discussed. The results show that the chemical etching removal by plasma and plasma etching The typical layers of the diamond film-base cross-section deposited on the decarburized pretreated YG8 cemented carbide substrate are as follows: diamond film / thin graphite carbon interlayer / fine WC layer / residual decarburized layer (η phase + W phase) / residual slack / YG8 primary matrix Methane content has a significant effect on the formation of CVD diamond film-base cross-sections at each tissue level