“深刻蚀曝光光刻技术及其在生物芯片领域中的应用研讨会”于 2 0 0 2年 8月 5日在成都召开。此次会议是由中国科学院光电技术研究所主办、成都中科百奥科技有限公司协办的为探讨和推动光刻技术的应用、促进微细加工技术的进步而举行的。在针对国内科研和产业严重脱节 ,科研和 “Deep etch exposure lithography and its application in the field of biochip” Symposium was held in Chengdu on August 5, 2002. The meeting was sponsored by the Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu Branch of the 100 Technology Co., Ltd. co-organized to explore and promote the application of lithography, micro-processing technology to promote progress. In the domestic research and industry severely out of touch, scientific research and