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提出了一个反应溅射的物理溅射动力学模型,基于捕获效应,并考虑了参数间相互影响.计算出的溅射参数与实测值相符.模型较好地描述了靶初始覆盖度与溅射稳定态之间的关系,说明了从金属溅射区向氧化物溅射区转变与从氧化物溅射区向金属溅射区转变的反应气体流量阈值的大小为什么不同.真空室氧分压对靶面氧化物形成速率的影响是引起氧化物分数与氧流量关系曲线不连续点的主要原因,靶面氧化物覆盖度初始值的不同导致了氧流量阈值的多值性.
A physical sputtering kinetic model of reactive sputtering was proposed based on the capture effect and the interaction between the parameters was taken into account.The calculated sputtering parameters were consistent with the measured values.The model described the initial target coverage and sputtering The relationship between the stable states shows the difference between the flow rate thresholds of the transition from the metal sputtering region to the oxide sputtering region and the transition from the oxide sputtering region to the metal sputtering region. The effect of formation rate of target surface oxide is the main reason for the discontinuity of the curve of oxide fraction and oxygen flow. The initial value of oxide coverage of target surface leads to the multi-value of oxygen flow threshold.