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高强度、低损耗Al_2O_3窗,无渗透溅散金属化和新的二次电子倍增抑制涂层为有效地提高平均功率和增加微波窗的靠可性提供了可能。与目前采用的窗相比较,新窗具有高50％的抗弯强度(60Kpsi)和低10倍的损耗角正切(5×10(-5)。此外,无渗透高频溅散金属化,因无金属化渗透达到较大的边缘强度和较低的微波损耗。 1000MuO和Cr_2O_3二次电子倍增抑制涂层改进了目前采用的标准Ti涂层(～60厚)而优先选用。新的涂层特别在高烘烤温度时达到较好的稳定性,由于涂层较厚故较容易控制,就MuO说来则可能达到较低的二次发射系数(δ)。
High-strength, low-loss Al 2 O 3 windows, sputtered-less metallization and new secondary electron multiplication suppression coatings offer the possibility of effectively increasing the average power and increasing the reliability of the microwave window. The new window has 50% higher bending strength (60 Kpsi) and 10 times lower loss tangent (5 x 10 (-5)) compared to the currently used windows. In addition, high-frequency, No metalized penetration to achieve greater edge strength and lower microwave loss. 1000MuO and Cr 2 O 3 double electron multiplication suppression coating to improve the current standard Ti coating (~ 60 thick) and preferred. The new coating special Better stability at high baking temperatures, easier control due to thicker coatings, and lower secondary emission coefficients (δ) for MuO.