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在30kW级直流电弧等离子喷射化学气相沉积装置下,采用Ar-H2-CH4混合气体,通过控制工艺参数,在钼衬底上分别制备了普通微米自支撑膜及多层金刚石自支撑膜并对其进行研究。结果显示,同普通微米膜相比,多层膜体是由微米晶金刚石层和纳米晶金刚石层组成,表面光滑,微米层与纳米层间具有相互嵌套式的界面;多层膜中各层膜体的内应力沿生长方向有明显变化,出现一个从压应力到拉应力变化的过程;在沉积过程中,随着层数变化,膜体的生长速率也发生相应的变化。
In the 30kW DC arc plasma jet chemical vapor deposition apparatus, the common microporous self-supporting film and the multi-layer diamond self-supporting film were prepared on the molybdenum substrate by controlling the process parameters by using Ar-H2-CH4 mixed gas, research. The results show that, compared with the common micro-membrane, the multi-layered membrane is composed of microgranular diamond layer and nanocrystalline diamond layer with a smooth surface and a nested interface between micro-layer and nano-layer. The internal stress of the film body changes obviously along the growth direction, and a change from compressive stress to tensile stress occurs. During the deposition process, the growth rate of the film body also changes correspondingly with the change of the layer number.