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采用磁控溅射方法制备NiFe/FeMn双层膜 (分别以Ta、Cu作为缓冲层 ,Ta作为保护层 )。实验发现 ,以Ta为缓冲层的NiFe/FeMn双层膜的交换偏置场比以Cu为缓冲层的NiFe/FeMn双层膜的交换偏置场大 ,而矫顽力却很小。我们从织构、界面粗糙度两方面对其中的原因进行了分析。以Ta为缓冲层的NiFe/FeMn双层膜有好的织构且NiFe/FeMn界面较平滑 ,这引起了较强的交换偏置场和较低的矫顽力。
NiFe / FeMn bilayers were prepared by magnetron sputtering (Ta, Cu as buffer layers and Ta as protective layer respectively). It is found that the exchange bias field of NiFe / FeMn bilayers with Ta as buffer layer is larger than the exchange bias field of NiFe / FeMn bilayers with Cu buffer layer and the coercivity is small. We analyze the reasons of the two aspects of texture and interface roughness. The NiFe / FeMn bilayers with Ta as a buffer layer have a good texture and the NiFe / FeMn interface is smoother, resulting in a stronger exchange bias field and lower coercivity.