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意法半导体有限公司近日向通用市场推出CB45000系列标准单元.CB45000已被几家主要用户采用.它使用0.35微米HCMOS6工艺及可达5级的金属化技术.提供典型的可用门密度(含布线)达15000门/平方毫米的超高性能半用户技术及其可实现超过300万等效门复杂系统的能力.嵌入功能扩展库包括功能强大的微控制器与DSP功能、能够满足硅片制作当今设计要求.
STMicroelectronics recently introduced the CB45000 series of standard cells to the general market. The CB45000 has been adopted by several major customers. It uses a 0.35 micron HCMOS6 process and up to five metallization technologies. Typical available gate density (with wiring) Ultra-high-performance half-user technology up to 15,000 gates/square millimeter and its ability to realize a complex system of more than 3 million equivalent gates. The embedded function expansion library includes powerful microcontroller and DSP functions to meet the current design of silicon wafer fabrication. Claim.