ＭＥＢＥＳ－４型电子束曝光机简介１前言随着半导体集成电路制造技术向着亚半微米和超大规模集成（ＵＬＳＩ）时代的跨进，作为半导体微细加工技术核心的电子束曝光技术，以其高精度、高分辨率、高生产率、高自动化程度和灵活的图形设计，短的制版周期等显著优点，而倍受... Introduction of MEBES-4 Electron Beam Exposure Machine 1 INTRODUCTION With the advancement of semiconductor integrated circuit manufacturing technology toward the sub-micron and ultra-large-scale integration (ULSI) times, electron beam exposure technology, which is the core of semiconductor micro-fabrication technology, , High resolution, high productivity, high degree of automation and flexible graphic design, short plate-making cycle and other significant advantages, and much ...