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对钨基材料表面上射频磁控溅射沉积的碳膜进行了氩离子和氮离子的辐照，并作了XRD及XPS的分析。分析结果表明，不同离子辐照引起碳膜微结构的变化亦不同。氮离子辐照不仅使碳膜元素与基体元素发生混合，而且导致碳膜发生相变，生成碳-钨化合物，如α－W2C、WCx，同时氮离子本身与钨反应生成氮-钨化合物，如α－WN。氮离子辐照使无定形的碳膜中的生成相发生晶化，晶化的碳-钨化合物相、氮-钨化合物相的含量随氮离子辐照剂量的增加而提高。氩离子辐照却无此诱发作用，但发现氩离子辐照可有效消除氧的污染。随着氩离子剂量的增加，碳膜中污染氧的含量也随之减少。同时对有关机理作了相应的探讨。
The carbon films deposited by RF magnetron sputtering on the surface of tungsten-based materials were irradiated by argon ions and nitrogen ions, and the XRD and XPS analyzes were made. The analysis results show that the changes of the microstructure of the carbon film caused by different ion irradiation are also different. Nitrogen ion irradiation not only causes the carbon film elements and the matrix elements to be mixed, but also causes the carbon film to undergo phase transformation to generate carbon-tungsten compounds such as α-W2C and WCx. At the same time, the nitrogen ions react with tungsten to generate nitrogen-tungsten compounds such as α-WN. Nitrogen ion irradiation led to the formation of amorphous phases in the carbon film. The content of crystallized carbon-tungsten compound phase and nitrogen-tungsten compound phase increased with the increase of nitrogen ion irradiation dose. Argon ion irradiation did not induce this effect, but found that argon ion irradiation can effectively eliminate oxygen pollution. With the increase of argon ion dose, the content of contaminated oxygen in the carbon film also decreases. At the same time made a corresponding discussion of the relevant mechanism.