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采用射频磁控溅射方法在玻璃衬底上制备了不同氧分压的Cu掺杂ZnO(ZnO∶Cu)薄膜.利用X射线衍射(XRD)、原子力显微镜(AFM)、紫外-可见分光光度计和光致荧光发光(PL)等表征技术,研究了不同氧分压对ZnO∶Cu薄膜的微观结构和光学特性的影响.研究结果显示,随着氧分压的增加,薄膜的(002)衍射峰先增强后减弱,同时(100)(、101)和(110)衍射峰在(002)衍射峰增加时减小,表明氧分压可以影响ZnO∶Cu薄膜的结晶取向.薄膜在紫外-可见光范围的透过率超过70%,同时随着氧分压的增加,薄膜的光学带隙值先增大后减小.通过对光致发光的研究表明,射频磁控溅射法在低氧和高氧环境条件下都可制得好的发光薄膜.
Cu-doped ZnO (ZnO: Cu) thin films with different oxygen partial pressures were prepared on glass substrates by RF magnetron sputtering.The structures of the films were characterized by X-ray diffraction (XRD), atomic force microscopy (AFM), UV-visible spectrophotometer And photoluminescence (PL) were used to investigate the effects of different partial pressure of oxygen on the microstructure and optical properties of ZnO: Cu films. The results show that the (002) diffraction peak (100), (101) and (110) diffraction peaks decrease as the (002) diffraction peak increases, indicating that the partial pressure of oxygen can influence the crystal orientation of the ZnO: Cu film. In the UV-Vis range And the optical band gap firstly increases and then decreases with the increase of partial pressure of oxygen.The research on photoluminescence shows that the RF magnetron sputtering has better performance in low oxygen and high Oxygen conditions can be made under good light-emitting film.