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采用双靶反应磁控溅射的方法,通过改变基体相对于靶材的位置制备了一系列不同化学成分的W1-xTixN薄膜。用X射线衍射仪,扫描电子显微镜,能量散色谱等检测手段对薄膜的表面状态,化学成分以及结构等进行了表征,采用UMT-3型多功能摩擦磨损试验机,在室温、大气环境、无润滑的条件下对不同成分WTiN薄膜的摩擦学性能进行了评价。试验结果表明:薄膜的化学成分伴随着位置的改变在W0.80Ti0.20N和W0.18Ti0.82N的范围内发生变化;在经历了800℃,1 h的退火以后不同位置制备的薄膜先后出现了TiN,TiN0.6O0.4,W2N,W等多种物相结构;随着Ti含量的增加,薄膜的纳米硬度最高可达29.8 GPa,弹性模量最高可达277.5 GPa。一系列摩擦数据显示x=0.52的薄膜在所制备的WTiN薄膜体系中拥有最佳的摩擦学性能。
A series of W1-xTixN thin films with different chemical compositions were prepared by changing the substrate’s position relative to the target by dual target reactive magnetron sputtering. The surface morphology, chemical composition and structure of the films were characterized by X-ray diffraction, scanning electron microscopy, energy dispersive spectroscopy and other means of detection. The samples were tested with UMT-3 multi-purpose friction and wear tester at room temperature, atmospheric environment, Tribological properties of WTiN films with different compositions were evaluated under lubrication conditions. The experimental results show that the chemical composition of the thin film changes with the change of position within the range of W0.80Ti0.20N and W0.18Ti0.82N. The thin films prepared at different positions after annealed at 800 ℃ for 1 h TiN, TiN0.6O0.4, W2N, W and so on. With the increase of Ti content, the nano-hardness of the film can reach 29.8 GPa and the elastic modulus can reach 277.5 GPa. A series of friction data show that the film with x = 0.52 has the best tribological properties in the prepared WTiN film system.