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采用中频孪生非平衡磁控溅射技术,制备了纳米晶结构NiOx电致变色薄膜。利用原子力显微镜、掠射X射线衍射、电化学设备、紫外分光光度计等测试手段分析薄膜结构及电致变色特性。结果表明:室温沉积获得表面质地均匀的NiOx薄膜;在±3V致色电压下,薄膜电致变色性能优异,对可见光透过率调制范围达30%以上,但薄膜寿命低。获得的薄膜为结构疏松的纳米晶结构,易于离子的注入和抽取,变色性能优异,但易发生Li+不可逆注入,薄膜寿命低。
The nanocrystalline NiOx electrochromic thin films were prepared by IF twin-unbalanced magnetron sputtering. The structure and electrochromic properties of the films were analyzed by atomic force microscopy, grazing X-ray diffraction, electrochemical equipment and UV spectrophotometer. The results show that NiOx films with uniform surface texture are obtained at room temperature. The electrochromic properties of the films are excellent at ± 3V, and the modulation range of visible light transmittance is over 30%, but the lifetime of the films is low. The obtained film has a loosely structured nanocrystalline structure, which is easy to implant and extract ions, and has excellent color changing properties. However, the film is prone to Li + irreversible implantation and has a low film life.