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AlO_x薄膜作为高效太阳能电池中P层钝化薄膜引起了光伏龙头企业的关注。本文利用最新研发的微波等离子增强化学气相沉积(MW-PECVD)系统,在单晶硅基体上用不同微波功率和生长温度制备氧化铝膜层样品,并通过扫描电镜、SE800椭偏仪和WT2000少子寿命测量仪对薄膜的成分、表面形貌、厚度、沉积速度、钝化性能进行分析。实验结果表明,LMW-PECVD制备的AlO_x薄膜沉积速度快且薄膜质量高,适用于大规模企业生产。此外,微波功率和生长温度都对AlO_x薄膜的钝化性能有着显著的影响。
AlO_x film as a p-layer passivation film in high-efficiency solar cells has aroused the concern of the leading enterprises in the photovoltaic industry. In this paper, using the newly developed microwave plasma enhanced chemical vapor deposition (MW-PECVD) system, the alumina film samples were prepared on a single crystal silicon substrate with different microwave powers and growth temperatures. SEM, SE800 ellipsometer and WT2000 Lifetime measuring instrument for film composition, surface morphology, thickness, deposition rate, passivation performance analysis. The experimental results show that AlO_x thin films prepared by LMW-PECVD have high deposition rate and high film quality, and are suitable for large-scale production. In addition, microwave power and growth temperature have a significant impact on the passivation properties of AlO_x films.