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近年来,随着大规模集成电路研制工作的发展,对高纯水中离子、微粒、细菌和胶体都提出了苛刻要求,这些杂质对MOS器件参数和成品率影响极大。在制备高纯水中,除了严格管理和操作之外,还必须选择合理流程和装置。 为了进一步改善我室水质以满足静态4K RAM和动态16KMOSRAM电路研制工作的需要,八二年分别应用电子工业部第十设计院及江苏宜兴超滤设备作为高纯水的后处理。根据永川地区水质状况,选用宜宾D201多孔树脂、采用多级过滤、微滤,超滤和紫外线杀菌等技术作后处理系统。为我室MOS电路研制工作提供了高纯水。
In recent years, with the development of large-scale integrated circuit research and development, high-purity water ions, particles, bacteria and colloids are made demanding, these impurities MOS device parameters and yield a great impact. In the preparation of high purity water, in addition to strict management and operation, but also must choose a reasonable process and device. In order to further improve the water quality of our room to meet the needs of static 4K RAM and dynamic 16KMOSRAM circuit development, we applied the Tenth Design Institute of the Ministry of Electronics Industry and the ultrafiltration equipment of Yixing of Jiangsu Province as the post-treatment of high-purity water in 1982 respectively. According to the water quality in Yongchuan area, Yibin D201 porous resin is selected, and multi-stage filtration, microfiltration, ultrafiltration and ultraviolet disinfection techniques are used as aftertreatment system. For my room MOS circuit research and development provides high-purity water.