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提出了一种测定氧化膜生长应力的双面氧化弯曲方法，它不象常规弯曲法那样为防止试样一个侧面发生氧化需镀制保护涂层，因而可用于较高温度及较长时间的氧化情况并可测定Al2O3膜的生长应力．由于高温下合金及薄氧化膜会发生蠕变，从而释放膜内应力，新方法应用了合金的蠕变数据，并采用数值计算法来获得氧化膜应力值．用这种方法测定了Fecralloy（Fe-22Cr-5Al-0．3Y）合金在1000℃空气中氧化形成的Al2O3膜的平均生长应力．Al2O3膜的平均生长应力为压应力，其绝对位随膜厚增大而减小．15h氧化期间，膜内应力大小从-7．94GPa变化到-0．30GPa．
A double-sided oxidation bending method for measuring the growth stress of an oxide film is proposed, which is not as the conventional bending method to prevent oxidation of one side of the sample to be coated with a protective coating, and thus can be used for oxidation at a higher temperature and for a longer time And the determination of the growth of Al2O3 film stress. Due to creep of the alloy and thin oxide film at high temperature, the internal stress of the film is released. The new method uses the creep data of the alloy and uses the numerical calculation method to obtain the stress value of the oxide film. The average growth stress of Al2O3 film formed by oxidation of Fecralloy (Fe-22Cr-5Al-0.3Y) alloy in air at 1000 ℃ was measured by this method. The average growth stress of Al2O3 film is compressive stress, and its absolute value decreases with the increase of film thickness. During 15h oxidation, the stress in the membrane varied from -7.94GPa to -0.30GPa.