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针对在半导体制造工艺参数优化过程中缺乏直观参考的问题,在微粒群优化算法(PSO)和等值线理论分析的基础上,将PSO与等值线矩形网格模型相结合,提出一种全新的工艺参数窗口选择方法,在二维标准多峰函数上验证了所提出方法的有效性,同时对所提出的方法进行了实际生产验证,对于双输入参数问题,该方法可以直接输出所有满足工艺要求的二维区域,从而为参数优化和范围选取提供直观参考,仿真测试结果和生产验证数据均表明了所提出的算法是一种有效的参数优化方法。
Aiming at the lack of visual reference in the process of semiconductor manufacturing process optimization, based on the theory of Particle Swarm Optimization (PSO) and contour analysis, combining the PSO with contour rectangle grid model, a new , The validity of the proposed method is verified on a two-dimensional standard multimodal function, and the actual production verification of the proposed method is carried out. For the two-input parameter problem, the method can directly output all the parameters satisfying the process The two-dimensional region is required to provide a visual reference for parameter optimization and range selection. Both the simulation test results and production verification data show that the proposed algorithm is an effective parameter optimization method.