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通过考虑互相关联的光学和工艺参数 ,设计了 3～ 5μm红外 12 8× 12 8硅衍射微透镜阵列。阵列中微透镜的孔径为 10 0μm,透镜 F数为 f / 1.5,微透镜阵列的中心距为 10 0μm。采用多次光刻和离子束刻蚀技术在硅衬底表面制备衍射微透镜阵列。对实际的工艺过程和制备方法进行了讨论 ,对制备出的 12 8× 12 8硅衍射微透镜阵列的光学性能和表面浮雕结构进行了测量。
By considering the interrelated optical and process parameters, a 3 ~ 5μm infrared 12 8 × 12 8 Si diffractive microlens array was designed. The aperture of the microlens in the array is 100 μm, the number of lens F is f / 1.5, and the center distance of the microlens array is 100 μm. Diffraction microlens array was prepared on the surface of silicon substrate by multiple photolithography and ion beam etching techniques. The actual process and preparation methods were discussed. The optical properties and surface relief structure of 12 8 × 12 8 Si diffractive microlens arrays were measured.