连续调节系统——可控硅PID控温装置可获得较高的控温精度。但因其造价太高而没有能在炉温控制方面普遍推广。两位调节控温系统结构简单,造价低廉,使用方便,控制功率大。因而,大多数热处理电炉仍然采用两位调节系统控制温度。但是,两位控温系统的炉温波动大,控温精度低。为此,本文提出了一种 Continuous adjustment system - silicon controlled temperature control device PID can get higher temperature accuracy. However, due to its high cost, it can not be widely promoted in the aspect of furnace temperature control. Two adjustment temperature control system is simple in structure, low in cost, easy to use and control power. As a result, most heat treatment furnaces still use two-position regulating systems to control temperature. However, the two temperature control system temperature fluctuations, temperature control accuracy is low. To this end, this paper presents a