一、前言 随着科学技术的飞跃发展,对各种光学器件的要求也越来越高,由此促使真空镀膜技术迅速发展,真空镀膜设备也不断更新。为实现高难度、复杂膜系的镀制,真空镀膜机中磁偏转电子枪也应运而生了。 国外,采用这种磁偏转电子枪有效地克服了直枪和环枪所存在的缺点,它以其体积小、结构简单、使用维护方便,能实现镀制高质量复杂膜系而展现于世。最近两年,在我国亦迅速发展起来,目前若干厂家竞相研制,现已陆续问世,投入使用。但就目前国内各厂家生产的这种枪来看,其X、Y扫描控制都不十分理想,这就影响到料面加热的均匀性,镀膜生产过程的重复性等,因此我们研制了此控制器。以实现对电子束的180°或 I. Introduction With the rapid development of science and technology, the requirements for various optical devices are also getting higher and higher, thus promoting the rapid development of vacuum coating technology and the continuous vacuum coating equipment. In order to achieve difficult, complex coating of the film system, vacuum coating machine magnetic deflection electron gun also came into being. Abroad, this magnetic deflection electron gun can effectively overcome the shortcomings of the guns and ring guns. It is demonstrated by its small size, simple structure, convenient use and maintenance, and high quality and complex plating. In the recent two years, our country has also developed rapidly. At present, a number of manufacturers are competing to develop their products. Now they have been put into use one after another and put into operation. However, the current domestic manufacturers of such guns point of view, the X, Y scan control are not very satisfactory, which affects the uniformity of the material heating, coating production process repeatability, and so we developed this control Device. To achieve 180 ° or electron beam