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在测定Ni及Ni-diamond 2种电沉积体系阴极极化曲线、电化学阻抗谱及微分电容曲线等基础上,对比研究了金刚石微粒对界面双电层的影响规律,以此探讨微粒在Ni-diamond复合电沉积中的电化学行为。结果表明:金刚石微粒的添加使沉积体系的极化度变小,法拉第电阻增加,双电层电容降低,同时使微分电容值明显降低;进一步分析发现,与影响电极体系法拉第导纳的金刚石微粒在电极表面的覆盖率θF相比,影响非法拉第导纳的覆盖率θNF可更有效的反映能进入镀层的微粒在电极表面的覆盖率;Ni及Ni-diamond两沉积体系的电极表面在沉积电位附近均荷负电,但金刚石微粒的添加使得复合体系电极表面的负电荷密度不及镀镍体系的1/200。
Based on the determination of cathodic polarization curve, electrochemical impedance spectroscopy and differential capacitance curves of Ni and Ni-diamond electrodeposits, the influence of diamond particles on the interface electric double layer was studied. Electrochemical behavior of diamond composite electrodeposition. The results show that the addition of diamond particles decreases the polarization degree of the deposition system, the Faraday resistance increases, the electric double layer capacitance decreases, and the differential capacitance value decreases significantly. Further analysis shows that in the presence of Faraday admittance diamond particles Electrode surface coverage θF, the impact of the Faraday admittance coverage θNF can reflect more effectively into the coating of particles in the electrode surface coverage; Ni and Ni-diamond deposition system of the electrode surface near the deposition potential All negatively charged, but the addition of diamond particles makes the surface of the composite system negative charge density less than nickel plating system 1/200.