Effects of sputtering power and annealing temperature on surface roughness of gold films for high-re

来源 :核技术:英文版 | 被引量 : 0次 | 上传用户：aidanzeng

【摘要】

：

Gold films deposited by direct current magnetron sputtering are used for synchrotron radiation optics. In this study, the microstructure and surface roughness o

【作者】

：

Jia-Qi Chen Qiu-Shi Huang Run-

【机构】

：

MOEKeyLaboratoryofAdvancedMicro-StructuredMaterials

【出处】

：

核技术:英文版

【发表日期】

：

2019年7期

【关键词】

：

Gold films SPUTTERING power ANNEALING Microstructure ROUGHNESS

【基金项目】

：

the National Key R&D Program of China (Nos. 2016YFA0401304 and 2017YFA0403302),the National Natural Science Foundation of China (NSFC)(Nos. 61621001, 11505129, and U1732268).

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Gold films deposited by direct current magnetron sputtering are used for synchrotron radiation optics. In this study, the microstructure and surface roughness of gold films were investigated for the purpose of developing high-reflectivity mirrors. The dep

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