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在X射线分析工作中,某些衍射相摄照的曝光时间有时长达几十小时。因此,提高X射线源的强度和缩短曝光时间,是一个具有实际意义的问题。根据电子束聚焦提高X线管的比功率,使衍射相摄照时间大大缩短的原理,我们把JC-20型可拆式晶体分析X射线机(1960年产品)作了一些改装:在原来X射线管的基础上,于聚焦罩上加装150～200伏特以下的负栅偏压,用以聚焦射向靶子的电子束,并且调整聚焦罩至灯丝的距离。改装后的X射线机照相时间,缩短到改装前的1/6左右,比之VEM型X射线机的照相时间缩短到1/15左右。对于粉末相的分辨率也有所提高。
In the X-ray analysis work, some diffraction phase photo exposure time sometimes up to tens of hours. Therefore, raising the intensity of the X-ray source and shortening the exposure time is a matter of practical significance. Based on the principle of electron beam focusing to increase the specific power of the X-ray tube and greatly shorten the photographing time of the diffraction phase, we made some modifications to the JC-20 detachable crystal analysis X-ray machine (product of 1960): in the original X On the basis of the ray tube, a negative grid bias voltage of 150 to 200 volts or less is applied to the focus mask to focus the electron beam directed to the target and adjust the distance from the focus mask to the filament. Modified X-ray machine photography time, shortened to about 1/6 before modification, than the VEM-type X-ray machine to shorten the photographic time to about 1/15. The resolution of the powder phase is also improved.